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Event

581. KI-Entwicklerstammtisch

Immer am zweiten Dienstag im Monat. Veranstalter: Mittelstand 4.0

Reference

582. VE-ARiS

3 stacked circuit boards with components

IMMS developed copy protection solutions for integrated circuits to secure the know-how of partners

Reference

583. EXPerimentierfeld zur datengetRiebenen VErnetzung und DigitaliSierung in der LandwirtSchaft (EXPRESS)

Ingolf Römer, Martin Schieck, Hannes Mollenhauer, Rikard Grass, Silvia Krug, Juliane Welz, Valentin Knitsch, online 2021 41. GIL-Jahrestagung, Informations- und Kommunikationstechnologien in kritischen Zeiten

Reference

584. Best Paper Award für den Beitrag: Picometer-Scale Positioning of a Linear Drive System via Feedforward-Feedback Control

Auszeichnung mit dem Best Paper Award auf der International Conference of Mechatronics, ICM, 7th-9th March 2021, Kashiwa, Japan

Event

585. 41. GIL-Jahrestagung

Leibniz-Institut für Agrartechnik und Bioökonomie e.V.

Press release

586. Thuringian project develops novel technology platform for the detection of SARS-CoV-2

Voruntersuchungen am IMMS für miniaturisierte Messtechnik für kleinste Ströme zum SARS-CoV-2-Nachweis. Foto: IMMS.

Change in electrical conductivity visualises virus material

Reference

587. ViroGraph

Preliminary investigations at IMMS with a sensor from Jena University with 15 graphene FETs for miniaturised measurement technology for SARS-CoV-2 detection. Photograph: IMMS.

A novel technology platform with graphene-based field-effect transistor for the detection of SARS-CoV-2 is being developed

Reference

588. Picometer-Scale Positioning of a Linear Drive System via Feedforward-Feedback Control

Alex S. Huaman, Michael Katzschmann, Steffen Hesse, Christoph Schäffel, Christoph Weise, Denis Dontsov, Eberhard Manske, Johann Reger, Kashiwa, Japan 2021 2021 IEEE International Conference on Mechatronics (ICM2021)

Event

589. ICM 2021

International Conference on Mechatronics

Reference

590. Nanopositioning and fabrication using the Nano Fabrication Machine with a positioning range up to ⊘100 mm

Jaqueline Stauffenberg, Christoph Reuter, Ingo Ortlepp, Mathias Holz, Denis Dontsov, Christoph Schäffel, Jens-Peter Zöllner, Ivo W. Rangelow, Steffen Strehle, Eberhard Manske, 2021 Proc. SPIE 11610, Novel Patterning Technologies