1173 results
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A Post-Layout Optimization Method With Automatic Device Type Selection for BiCMOS Analog Circuits
T. Reich1. B. Dimov1. Ch. Lang1. V. Boos1. E. Hennig1.International Conference on Electronics Circuits and Systems, 13.-16. Dezember, 2009, Hammamet, Tunesien1IMMS Institut für Mikroelektronik- und Mechatronik-Systeme gemeinnützige GmbH, Ilmenau.Talk -
A novel technique for CAD-optimization of analog circuits with bipolar transistors
B. Dimov1. V. Boos1. T. Reich1. Ch. Lang1. E. Hennig1. R. Sommer1.Advances in Radio Science, 7, 219-223, 20091IMMS Institut für Mikroelektronik- und Mechatronik-Systeme gemeinnützige GmbH, Ilmenau.Article -
A Novel Technique for CAD-Optimization of Analog Circuits with Bipolar Transistors
B. Dimov1. V. Boos1. T. Reich1. Ch. Lang1. E. Hennig1. R. Sommer1.Kleinheubacher Tagung, 22.-25. September 2008, Miltenberg, Germany1IMMS Institut für Mikroelektronik- und Mechatronik-Systeme gemeinnützige GmbH, Ilmenau.Talk -
A Novel Low-Voltage Bandgap Reference Topology
M. Isikhan1.21. Mikroelektronik-Seminar, 16.04.2009, Erfurt1IMMS Institut für Mikroelektronik- und Mechatronik-Systeme gemeinnützige GmbH, Ilmenau.Talk -
A novel low leakage EEPROM cell for application in an extended temperature range (-40°C up to 225°C)
S. Richter1. D. Kirsten1. D. Nuernbergk1. S. Richter2.A novel low leakage EEPROM cell for application in an extended temperature range (-40°C up to 225°C), D. Flandre et al. (eds.), Science and Technology of Semiconductor-On-Insulator Structures and Devices Operating in a Harsh Enviroment, pa: 285-290, Kluwer Academic Publishers, Januar 20051IMMS Institut für Mikroelektronik- und Mechatronik-Systeme gemeinnützige GmbH, Ilmenau. 2X-FAB AG.Article -
A novel low leakage EEPROM cell for application in an extended temperature range (-40°C up to 225°C)
D. Kirsten1. D. Nuernbergk1. S. Richter1. St. Richter2.Workshop 'SOI NATO Advanced Research', 25-30.04.2004, Kiev, Ukraine1IMMS Institut für Mikroelektronik- und Mechatronik-Systeme gemeinnützige GmbH, Ilmenau. 2X-FAB AG.Talk -
A new XY linear stage for Nano technology - The stage can draw 3 diameter true circle
F. Spiller1. O. Mollenhauer2.Tokyo/Japan, Advanced Photonics Technology Exhibition, November 20031IMMS Institut für Mikroelektronik- und Mechatronik-Systeme gemeinnützige GmbH, Ilmenau. 2TETRA GmbH.Talk -
A new tool for industrial tribology - Filling the gap between macro- and nano-tribology
S. Achanta. D. Drees. J. -P. Celis. O. Mollenhauer2. F. Spiller1.14th International Colloquium 'Tribology and Lubrication Engineering', Esslingen, January 13-15 20041IMMS Institut für Mikroelektronik- und Mechatronik-Systeme gemeinnützige GmbH, Ilmenau. 2TETRA GmbH.Talk -
A New Low Voltage Bandgap Reference Topology
M. Isikhan1. T. Reich1. A. Richter1. E. Hennig1.International Conference on Electronics Circuits and Systems, 13.-16. Dezember, 2009, Hammamet, Tunesien1IMMS Institut für Mikroelektronik- und Mechatronik-Systeme gemeinnützige GmbH, Ilmenau.Poster presentation -
A Modular Platform to Build Task Specific IoT Network Solutions for Agriculture and Forestry
Silvia Krug1,2. Marco Goetze1. Sören Schneider1. Tino Hutschenreuther1.2023 IEEE International Workshop on Metrology for Agriculture and Forestry (MetroAgriFor), Pisa, Italy, November 06-08, 2023, pp. 820-825, DOI: doi.org/10.1109/MetroAgriFor58484.2023.104241041IMMS Institut für Mikroelektronik- und Mechatronik-Systeme gemeinnützige GmbH, Ehrenbergstraße 27, 98693 Ilmenau, Germany. 2Mid Sweden University Sundsvall, Sweden.