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Optical, mechanical and electro-optical design of an interferometric test station for massive parallel inspection of MEMS and MOEMS

K.Gastinger1. K.H.Haugholt1. M. Kujawinska2. M.Jozwik2. C. Schäffel3. S. Beer4.

Paper 7389-56, SPIE Europe Optical Metrology, 14.- 18. Juni 2009, München

1SINTEF, Norway. 2Warsaw Univ. of Technology, Poland. 3IMMS Institut für Mikroelektronik- und Mechatronik-Systeme gemeinnützige GmbH, Ilmenau. 4Ctr. Suisse d'Electronique et de Microtechnique SA, Switzerland.
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SMARTIEHS

The newly developed measurement system can simultaneously inspect MEMS structures on wafer level to significantly reduce test effort.


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