2138 results
Reference
  771. Measuring and Optimizing Efficiency of Electrostatic Energy Harvesters for Sensor Applications  
Bjoern Bieske, Gerrit Kropp Alexander Rolapp Sensorica 2017, IEEE Workshop, http://d-nb.info/1137195215, 8-9 June 2017, Mülheim an der Ruhr  
Reference
  772. Measurement Precision of a Planar Nanopositioning Machine with a Range of Motion of Ø100 mm  
Jaqueline Stauffenberg, Ingo Ortlepp Johannes Belkner Denis Dontsov Enrico Langlotz Steffen Hesse Ivo Rangelow Eberhard Manske Applied Sciences. 2022; 12(15):7843. DOI: https://doi.org/10.3390/app12157843  
Reference
  773. Measurement of exposition to ultrasound in environmental and industrial areas  
Peter Holstein, Nicki Bader Hans-Joachim Münch Matthias Domke Udo Wagner Tino Hutschenreuther Sebastian Uziel 27th International Congress on Sound and Vibration (ICSV27), 11 -16 July 2021, ISBN 978-83-7880-799-5, ISSN 2329-3675, virtual  
Press release
  774. MDR Wissen ruft Menschen in Mitteldeutschland zur Meldung von Lärmquellen auf  
IMMS trägt Datendrehscheibe zum Lärmforschungsprojekt „StadtLärm“ bei  
Reference
  775. MC_NPS  
Combination of a high-precision drive from research with industrial control for nanometre-precise positioning in high-tech applications  
Reference
  776. Maßverkörperung mit integriertem Temperiersystem  
V. Bornmann, H.-U. Mohr Ch. Schäffel Deutsche Patentmeldung DE 103 27 505.3, Februar 2003  
Reference
  777. Markt-Trends  
W. Sinn, Ilmenau, F & E Report, Juni 2002  
Reference
  778. Manufacturing System for ultraprecision polishing of light curved optical parts  
Autorenkollektiv, Ch. Schäffel Micro Technology and Measurement Techniques and Equipment Eurogress, Aachen, Germany, International Topical Conference on Precision Engineering, 19th May 2003  
Reference
  779. Manche mögen's heiß - Silicon-on- Insulator- Bauelemente und ihre Besonderheiten  
D. Nuernbergk, M. Lange St. Richter W. Göttlich F&M, April 1999  
About us
  780. Management of the institute and contact  
Management of the institute and contact: Together with you, we would like to work on new solutions for the future. You can find the appropriate contact persons here or under the corresponding topics.  
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