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Residual stress measurements and mechanical properties of AlN thin films as ultra-sensitive materials for nanoelectromechanical systems
R. Grieseler1.
J. Klaus2.
M. Stubenrauch3.
K. Tonisch3.
S.Michael2.
J. Pezoldt1.
P. Schaaf1.
Philosophical Magazine, Special Issue: Nano-mechanical testing in materials research and development III, Volume 92, Issue 25-27, 2012, Pages 3392-3401, dx.doi.org/10.1080/14786435.2012.669074
1Materials for Electronics Group Institute of Micro- and Nanotechnologies MacroNano® and Institute of Materials Engineering, Ilmenau University of Technology.
2IMMS Institut für Mikroelektronik- und Mechatronik-Systeme gemeinnützige GmbH, Ilmenau.
3Nanotechnology Group Institute of Micro- and Nanotechnologies MacroNano® and Institute of Micro- and Nanoelectronics, Ilmenau University of Technology.
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